Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask
Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask
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DOI：
10.1364/oe.21.026227
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发表时间：
2013-11-04
期刊：
影响因子：
3.8
通讯作者：
Lin, Y.
中科院分区：
文献类型：
--
作者：
Lutkenhaus, J.;George, D.;Lin, Y.
In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials. (C) 2013 Optical Society of America
