Characterization of random rough surfaces by in-plane light scattering
Characterization of random rough surfaces by in-plane light scattering
复制标题
DOI：
10.1063/1.368419
复制
发表时间：
1998-11
影响因子：
3.2
通讯作者：
Yiping Zhao;Irene C. Wu;C.-F. Cheng;U. Block;Gwo-Ching Wang;T. Lu
中科院分区：
文献类型：
--
作者：
Yiping Zhao;Irene C. Wu;C.-F. Cheng;U. Block;Gwo-Ching Wang;T. Lu
利用面内光散射技术研究了硅背面粗糙表面的倒易空间结构。使用二极管阵列探测器收集散射强度的角分布。基于自仿射粗糙面衍射理论对衍射轮廓进行了解释。粗糙度参数，如界面宽度，横向相关长度，和粗糙度指数，提取的配置文件，并进行比较，通过真实的空间成像技术，如原子力显微镜和触针轮廓术。限制光散射测量的准确性的因素进行了讨论。
The reciprocal space structures of Si backside rough surfaces were studied using an in-plane light scattering technique. A diode array detector was used to collect the angular distribution of the scattered intensity. The diffraction profiles are interpreted based on the theory of diffraction from a self-affine rough surface. Roughness parameters such as interface width, lateral correlation length, and the roughness exponent, are extracted from the profiles and are compared to that obtained by real space imaging techniques such as atomic force microscopy and stylus profilometry. Factors that limit the accuracy of light scattering measurements are discussed.