Neutralization of methyl cation via chemical reactions in low-energy ion-surface collisions with fluorocarbon and hydrocarbon self-assembled monolayer films
Neutralization of methyl cation via chemical reactions in low-energy ion-surface collisions with fluorocarbon and hydrocarbon self-assembled monolayer films
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通过与碳氟化合物和碳氢化合物自组装单层膜的低能离子表面碰撞中的化学反应来中和甲基阳离子
DOI:
10.1016/s1044-0305(02)00440-3
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发表时间:
2002
影响因子:
3.2
通讯作者:
T. Randall Lee
中科院分区:
文献类型:
--
作者:
Á. Somogyi;Darrin L. Smith;V. Wysocki;R. Colorado;T. Randall Lee
Low-energy ion-surface collisions of methyl cation at hydrocarbon and fluorocarbon self-assembled monolayer (SAM) surfaces produce extensive neutralization of CH3+. These experimental observations are reported together with the results obtained for ion-surface collisions with the molecular ions of benzene, styrene, 3-fluorobenzonitrile, 1,3,5-triazine, and ammonia on the same surfaces. For comparison, low-energy gas-phase collisions of CD3+and 3-fluorobenzonitrile molecular ions with neutraln-butane reagent gas were conducted in a triple quadrupole (QQQ) instrument. Relevant MP2 6-31G*//MP2 6-31G*ab initioand thermochemical calculations provide further insight in the neutralization mechanisms of methyl cation. The data suggest that neutralization of methyl cation with hydrocarbon and fluorocarbon SAMs occurs by concerted chemical reactions, i.e., that neutralization of the projectile occurs not only by a direct electron transfer from the surface but also by formation of aneutralmolecule. The calculations indicate that the following products can be formed byexothermicprocessesandwithout appreciable activation energy: CH4(formal hydride ion addition) and C2H6(formal methyl anion addition) from a hydrocarbon surface and CH3F (formal fluoride addition) from a fluorocarbon surface. The results also demonstrate that, in some cases, simple thermochemical calculations cannot be used to predict the energy profiles because relatively large activation energies can be associated with exothermic reactions, as was found for the formation of CH3CF3(formal addition of trifluoromethyl anion).