Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness
Refractive index and extinction coefficient dependence of thin Al and Ir films on deposition technique and thickness
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DOI：
10.1364/oe.15.010744
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发表时间：
2007-08-20
期刊：
影响因子：
3.8
通讯作者：
Vahimaa, Pasi
中科院分区：
文献类型：
--
作者：
Lehmuskero, Anni;Kuittinen, Markku;Vahimaa, Pasi
我们表明，薄的金属薄膜的光学性质取决于膜的厚度，以及上的沉积技术。测量了几种厚度的电子束枪蒸发铝膜，并使用椭圆偏振法定义了折射率和消光系数。此外，原子层沉积的铱的折射率和消光系数与蒸发的铱样品进行了比较。(c)2007年美国光学学会
We show that the optical properties of thin metallic films depend on the thickness of the film as well as on the deposition technique. Several thicknesses of electron-beam-gun-evaporated aluminium films were measured and the refractive index and the extinction coefficient defined using ellipsometry. In addition, the refractive indexes and the extinction coefficients of atomic-layer-deposited iridium were compared with those of evaporated iridium samples. (c) 2007 Optical Society of America