Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography
Ultrafast patterning of nanostructures in polymers using laser assisted nanoimprint lithography
复制标题
DOI：
10.1063/1.1630162
复制
发表时间：
2003-11-24
影响因子：
4
通讯作者：
Chou, SY
中科院分区：
文献类型：
--
作者：
Xia, QF;Keimel, C;Chou, SY
我们提出并演示了一种纳米刻蚀技术，激光辅助纳米压印光刻(LAN)，在该技术中，聚合物通过单个准分子激光脉冲熔化，然后由熔融石英制成的模具进行压印。局域网已被用来在硅或石英衬底上的各种聚合物薄膜中形成纳米结构，并在整个模具区域内保持高保真。这里我们展示了200 nm的线宽为100 nm、高为90 nm的间距光栅。从聚合物熔化到印迹完成的整个印迹小于500 ns。该模具已多次使用，每次压痕之间都没有清洗。局域网不仅大大缩短了压印加工时间，还显著减少了基材和模具的加热和膨胀，使两者之间的叠层对准更好。(C)2003年美国物理研究所。
We propose and demonstrate a nanopatterning technique, laser-assisted nanoimprint lithography (LAN), in which the polymer is melted by a single excimer laser pulse and then imprinted by a mold made of fused quartz. LAN has been used to pattern nanostructures in various polymer films on a Si or quartz substrate with high fidelity over the entire mold area. Here we show 200 nm pitch gratings with 100 nm linewidth and 90 nm height. The entire imprint from melting the polymer to completion of the imprint is less than 500 ns. The mold has been used multiple times without cleaning between each imprint. LAN not only greatly shortens the imprint processing time, but also significantly reduces the heating and expansion of the substrate and mold, leading to better overlay alignment between the two. (C) 2003 American Institute of Physics.