Electron beam induced surface activation: a method for the lithographic fabrication of nanostructures via catalytic processes
Electron beam induced surface activation: a method for the lithographic fabrication of nanostructures via catalytic processes
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DOI：
10.1007/s00339-014-8578-x
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发表时间：
2014-11-01
影响因子：
2.7
通讯作者：
Marbach, Hubertus
中科院分区：
文献类型：
--
作者：
Marbach, Hubertus
在聚焦电子束诱导加工 (FEBIP) 中，扫描电子显微镜或透射电子显微镜的非常窄的电子束用于在纳米尺度上局部修改物质。最近，FEBIP 家族可以通过聚焦电子束诱导表面活化 (EBISA) 技术得到显着扩展。在 EBISA 中，表面本身在不存在前体分子的情况下通过电子束的撞击而被化学激活。在第二个 EBISA 处理步骤中，表面暴露于前体分子，然后该前体分子在预照射/活化区域催化分解，并最终在延长前体剂量时继续自催化生长。这样，电子辐照和前驱体剂量被有效地分开。优点之一是，由于自催化生长，相应纳米结构的尺寸可以通过前驱体剂量来控制，并且可以省略相应的电子邻近效应。另一个优点是在前体剂量期间并行处理预照射区域。与传统的电子束诱导沉积方法相比，这种方法有可能显着减少较大沉积物的制造时间，在传统的电子束诱导沉积方法中，前体分子通过电子的撞击依次解离。介绍并讨论了相对较新的 EBISA 技术的基本原理和明显的进一步发展以及潜力和挑战，以及 FEBIP 中更一般的催化效果。
In focused electron beam induced processing (FEBIP), the very narrow electron beam of a scanning electron microscope or transmission electron microscope is used to locally modify matter on the nanometer scale. Recently, the family of FEBIP could be considerably expanded by the technique of focused electron beam induced surface activation (EBISA). In EBISA, the surface itself gets chemically activated by the impact of the electron beam without the presence of precursor molecules. In the second EBISA processing step, the surface is exposed to a precursor molecule which is then catalytically decomposed at the pre-irradiated/activated areas and eventually continues to grow autocatalytically upon prolonged precursor dosage. In this way, electron irradiation and precursor dosage are effectively separated. One of the advantages is that, due to the autocatalytic growth, the size of the corresponding nanostructures can be controlled by the precursor dosage and corresponding electron proximity effects can be omitted. Another advantage is the parallel processing of the pre-irradiated regions during precursor dosage. This bears the potential to significantly reduce the fabrication times for larger deposits compared to the classical electron beam induced deposition approach, in which precursor molecules are sequentially dissociated by the impact of the electron. The fundamentals and apparent further developments as well as the potential and challenges of the comparably new EBISA technique, and more general of catalytic effects in FEBIP are presented and discussed.