Direct observation of an anisotropic in-plane residual stress induced by B addition as an origin of high magnetic anisotropy field of Ru/FeCoB film
Direct observation of an anisotropic in-plane residual stress induced by B addition as an origin of high magnetic anisotropy field of Ru/FeCoB film
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DOI：
10.1063/1.3350899
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发表时间：
2010-04
影响因子：
3.2
通讯作者：
K. Hirata;S. Gomi;Yasuhiro Mashiko;S. Nakagawa
中科院分区：
文献类型：
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作者：
K. Hirata;S. Gomi;Yasuhiro Mashiko;S. Nakagawa
虽然在Ru衬底制备的无硼FeCo薄膜具有各向同性的面内磁性，但在Ru衬底制备的含硼FeCoB薄膜表现出较大的面内磁性各向异性，各向异性场高达500 Oe。采用x射线衍射分析的sin2 ψ法研究了硼对FeCoB薄膜平面内各向异性残余应力的影响。在Ru/FeCo薄膜中观察到较大的各向同性压应力。Ru/FeCoB薄膜的面内残余应力呈各向异性。沿Ru/FeCoB薄膜易轴方向的压应力释放量大于沿硬轴方向的压应力释放量。这种各向异性残余应力通过逆磁致伸缩效应被认为是面内磁各向异性的来源。由于面靶溅射系统的配置，硼原子的溅射和沉积是各向异性的，因此硼原子沿入射方向穿透FeCo晶体并释放压应力。
Although boron-free FeCo films prepared on a Ru underlayer exhibits isotropic in-plane magnetic property, boron added FeCoB films prepared on Ru underlayer revealed large in-plane magnetic anisotropy with a high anisotropy field of 500 Oe. The effect of boron addition on the in-plane anisotropic residual stress in FeCoB film was investigated using sin2 ψ method of x-ray diffraction analysis. Large isotropic compressive stress was observed in Ru/FeCo film. In contrast, anisotropic in-plane residual stress was observed in Ru/FeCoB film. The compressive stress along the easy axis of Ru/FeCoB film is released more than that along the hard axis. Such anisotropic residual stress is regarded as an origin of the in-plane magnetic anisotropy through inverse magnetostriction effect. Owing to the configuration of the facing targets sputtering system, boron atoms are sputtered and deposited anisotropically, and so they penetrate FeCo crystals and release the compressive stress along the incidence direction.