Modeling High Temperature and Exposure Time Interactions on Pittosporum tobira Root Cell Membrane Thermostability
Modeling High Temperature and Exposure Time Interactions on Pittosporum tobira Root Cell Membrane Thermostability
复制标题
模拟高温和暴露时间对海桐根细胞膜热稳定性的相互作用
DOI：
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发表时间：
1985
影响因子：
1.9
通讯作者：
D. Ingram
中科院分区：
文献类型：
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作者：
D. Ingram
海桐的离体根暴露于25° C至60°C的温度30至300分钟，然后通过电解质渗漏程序测定细胞膜热稳定性。每个暴露持续时间对处理温度的反应是S形的。引起根细胞膜损伤的临界温度随着暴露时间的增加呈线性下降。提出了一个数学模型来描述处理温度和暴露时间对膜热稳定性的相互作用。
Excised roots of Pittosporum tobira Thunb. were exposed to temperatures of 25° to 60°C for 30 to 300 min before cell membrane thermostability was determined by electrolyte leakage procedures. Response to treatment temperature for each exposure duration was sigmoidal. The critical temperature causing injury to root cell membranes decreased linearily as exposure duration increased exponentially. A mathematical model to describe the interaction of treatment temperature and exposure duration on membrane thermostability is presented.