Formation of a new (1T) trigonal NbS2 polytype via atmospheric pressure chemical vapour depositionElectronic supplementary information (ESI) available: structure refinements of the NbS2 films and crystallographic data in CIF format. See http://www.rsc.org/suppdata/jm/b3/b315782m/
Formation of a new (1T) trigonal NbS2 polytype via atmospheric pressure chemical vapour depositionElectronic supplementary information (ESI) available: structure refinements of the NbS2 films and crystallographic data in CIF format. See http://www.rsc.org/suppdata/jm/b3/b315782m/
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DOI：
10.1039/b315782m
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发表时间：
2004-01
影响因子：
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通讯作者：
C. Carmalt;T. Manning;I. Parkin;Emily S. Peters;A. Hector
中科院分区：
文献类型：
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作者：
C. Carmalt;T. Manning;I. Parkin;Emily S. Peters;A. Hector
描述了五氯化铌与六甲基二硅硫烷和叔丁基二硫化物在 400–600 °C 下发生常压化学气相沉积反应，形成了一种新的三方晶系二硫化铌 1T-NbS2；薄膜在玻璃上生长，在 500–600 °C 下沉积的薄膜是结晶的。
The formation of a new trigonal polytype of niobium disulfide, 1T-NbS2, is described from the atmospheric pressure chemical vapour deposition reaction of niobium pentachloride with hexamethyldisilathiane and tert-butyl disulfide at 400–600 °C; films were grown on glass and those deposited at 500–600 °C were crystalline.