Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films

Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films
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DOI:
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发表时间:
2023
期刊:
影响因子:
3.4
通讯作者:
Rainer Kling
Rainer Kling
中科院分区:
材料科学3区
文献类型:
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作者:
Yi Wang;Tim Gehring;Qihao Jin;Jan Dycke;Rainer Kling

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