Highly textured ZnO thin films: a novel economical preparation and approachment for optical devices, UV lasers and green LEDs
Highly textured ZnO thin films: a novel economical preparation and approachment for optical devices, UV lasers and green LEDs
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DOI：
10.1016/j.matchemphys.2003.09.018
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发表时间：
2004-06
影响因子：
4.6
通讯作者：
K. Ramamoorthy;M. Arivanandhan;K. Sankaranarayanan;C. Sanjeeviraja
中科院分区：
文献类型：
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作者：
K. Ramamoorthy;M. Arivanandhan;K. Sankaranarayanan;C. Sanjeeviraja
制备高质量ZnO薄膜并对其物理、化学性质进行分析，在光电器件、紫外激光、绿色led、微电子和微加工技术中具有广泛的应用。在本研究中，利用锌酸钠浴在玻璃衬底上制备了具有101取向的高织构氧化锌（ZnO）薄膜。采用Philips-Xpert MPD-XRD、Hitachi-SEM、EDAX、Optical、FTIR和PL对膜进行了表征，以证明膜适合商用器件质量。研究了浸渍次数对薄膜生长及相关性能的影响。通过XRD观察到含有纳米颗粒的高ASTM标准多晶织构薄膜。材料（ZnO）经EDAX和FTIR确证。扫描电镜显示均匀附着薄膜的存在。随着浸出次数的增加，籽粒尺寸（nm）增大，光照强度减小。优化后的ZnO薄膜在可见光范围内的平均透射率为85%。光学和PL研究证明了所制备薄膜在光学器件、紫外激光器和绿色led中的适用性。
Fabrication of high quality ZnO thin films and analysis on its physical, chemical properties have applications in opto-electronic devices, UV laser, green LEDs, microelectronics and micro-machining technologies. In the present investigation, highly textured zinc oxide (ZnO) thin films with a preferred (101) orientation were prepared by chemical bath deposition using a sodium zincate bath on glass substrates. The films were characterized by Philips-Xpert MPD-XRD, Hitachi-SEM, EDAX, Optical, FTIR and PL in order to justify the suitability for commercial device quality. The effects of number of dippings on thin film growth and allied properties were investigated. Highly ASTM standard polycrystalline textured thin films contain nano-grains were observed by XRD. The material (ZnO) was confirmed by EDAX and FTIR. SEM reveals the presence of uniform adherent thin film. Increasing in grain size (nm) and decreasing in PL intensity were observed, while increasing the number of dippings. The optimized ZnO thin films have average transmission 85% in the visible range. Optical and PL studies demonstrated the suitability of the prepared films for optical devices, UV lasers and green LEDs.