Photochemistry of refractive index structures in poly(methyl methacrylate) by femtosecond laser irradiation
Photochemistry of refractive index structures in poly(methyl methacrylate) by femtosecond laser irradiation
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DOI:
10.1364/ol.32.000190
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发表时间:
2007-01-15
期刊:
影响因子:
3.6
通讯作者:
Chalker, Paul R.
中科院分区:
文献类型:
--
作者:
Baum, Alexandra;Scully, Patricia J.;Chalker, Paul R.
Femtosecond, subablation threshold photomodification of poly(methyl methacrylate) (PMMA) at 387 nm is explored to enable fabrication of optical components. Volatile fragment analysis (thermal desorption gas chromatography-mass spectrometry) and molecular weight distribution monitoring (size exclusion chromatography) suggest photochemical modification, involving direct cleavage of the polymer backbone and propagation via chain unzipping under formation of monomers, similar to the pyrolytic degradation of PMMA. Waveguides were produced in undoped, clinical-grade PMMA, showing an increased refractive index in the laser focal region (Delta n(max)=4 X 10(-3)). (c) 2006 Optical Society of America.