Large-Area X-ray Lithography System for LIGA Process Operating in Wide Energy Range of Synchrotron Radiation
Large-Area X-ray Lithography System for LIGA Process Operating in Wide Energy Range of Synchrotron Radiation
复制标题
用于宽能量范围同步辐射的 LIGA 工艺的大面积 X 射线光刻系统
DOI：
10.1143/jjap.44.5500
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发表时间：
2005
影响因子：
1.5
通讯作者：
H. Hara
中科院分区：
文献类型：
--
作者：
Y. Utsumi;T. Kishimoto;T. Hattori;H. Hara
我们在兵库大学的新subaru设施开发了一种新的x射线光刻系统，用于光刻石墨，电振成形和变形过程（LIGA过程）。x射线光刻系统可以利用两个不同的能量区域：一个是高能量区域：从2 keV到12 keV，另一个是低能量区域，从1到2 keV。每个能量区域可以根据所需微结构的大小和形状进行选择。在a4尺寸的区域上成功地进行了大面积图案，图案厚度高度均匀。此外，使用该x射线光刻系统还实现了使用高x射线能量区域的高纵横比图像化。
We developed a new X-ray lithography system for the lithographite, galvanoformung and abformung process (LIGA process) using synchrotron radiation at the NewSUBARU facility of the University of Hyogo. The X-ray lithography system can utilize two different energy regions: one is a high-energy region: from 2 keV to 12 keV, and the other is a low-energy region from 1 to 2 keV. Each energy region can be selected in accordance with the size and shape of the desired microstructures. Large-area patterning across an A4-size area was successfully performed with a highly uniform pattern thickness. Furthermore, high-aspect-ratio patterning using a high-X-ray-energy region was also achieved using this X-ray lithography system.