Coupled nuclear-electronic decay dynamics of O2 inner valence excited states revealed by attosecond XUV wave-mixing spectroscopy.
Coupled nuclear-electronic decay dynamics of O2 inner valence excited states revealed by attosecond XUV wave-mixing spectroscopy.
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阿秒 XUV 波混合光谱揭示 O2 内价激发态的耦合核电子衰变动力学。
DOI:
10.26434/chemrxiv.13079750.v1
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发表时间:
2020
影响因子:
3.4
通讯作者:
D. Neumark
中科院分区:
文献类型:
--
作者:
Yen;A. Fidler;A. Sandhu;R. Lucchese;C.;William McCurdy;S. Leone;D. Neumark
Multiple Rydberg series converging to the O2+ c 4Σ-u state, accessed by 20-25 eV extreme ultraviolet (XUV) light, serve as important model systems for the competition between nuclear dissociation and electronic autoionization. The dynamics of the lowest member of these series, the 3sσg state around 21 eV, has been challenging to study owing to its ultra-short lifetime (<10 fs). Here, we apply transient wave-mixing spectroscopy with an attosecond XUV pulse to investigate the decay dynamics of this electronic state. Lifetimes of 5.8 ± 0.5 fs and 4.5 ± 0.7 fs at 95% confidence intervals are obtained for v = 0 and v = 1 vibrational levels of the 3s Rydberg state, respectively. A theoretical treatment of predissociation and electronic autoionization finds that these lifetimes are dominated by electronic autoionization. The strong dependence of the electronic autoionization rate on the internuclear distance because of two ionic decay channels that cross the 3s Rydberg state results in the different lifetimes of the two vibrational levels. The calculated lifetimes are highly sensitive to the location of the 3s potential with respect to the decay channels; by slight adjustment of the location, values of 6.2 and 5.0 fs are obtained computationally for the v = 0 and v = 1 levels, respectively, in good agreement with experiment. Overall, an intriguing picture of the coupled nuclear-electronic dynamics is revealed by attosecond XUV wave-mixing spectroscopy, indicating that the decay dynamics are not a simple competition between isolated autoionization and predissociation processes.
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影响因子:
56.9
作者:
Kobayashi, Yuki;Chang, Kristina F.;Leone, Stephen R.
通讯作者:
Leone, Stephen R.
影响因子:
16.6
作者:
Marroux HJB;Fidler AP;Ghosh A;Kobayashi Y;Gokhberg K;Kuleff AI;Leone SR;Neumark DM
通讯作者:
Neumark DM
影响因子:
2.9
作者:
A. Plunkett;N. Harkema;R. Lucchese;C. W. McCurdy;A. Sandhu
通讯作者:
A. Plunkett;N. Harkema;R. Lucchese;C. W. McCurdy;A. Sandhu
影响因子:
56.9
作者:
Ott, Christian;Kaldun, Andreas;Pfeifer, Thomas
通讯作者:
Pfeifer, Thomas