A transmission electron microscope study of Néel skyrmion magnetic textures in multilayer thin film systems with large interfacial chiral interaction.
A transmission electron microscope study of Néel skyrmion magnetic textures in multilayer thin film systems with large interfacial chiral interaction.
复制标题
DOI:
10.1038/s41598-018-23799-0
复制
发表时间:
2018-04-09
影响因子:
4.6
通讯作者:
Marrows CH
中科院分区:
文献类型:
--
作者:
McVitie S;Hughes S;Fallon K;McFadzean S;McGrouther D;Krajnak M;Legrand W;Maccariello D;Collin S;Garcia K;Reyren N;Cros V;Fert A;Zeissler K;Marrows CH
Skyrmions in ultrathin ferromagnetic metal (FM)/heavy metal (HM) multilayer systems produced by conventional sputtering methods have recently generated huge interest due to their applications in the field of spintronics. The sandwich structure with two correctly-chosen heavy metal layers provides an additive interfacial exchange interaction which promotes domain wall or skyrmion spin textures that are Néel in character and with a fixed chirality. Lorentz transmission electron microscopy (TEM) is a high resolution method ideally suited to quantitatively image such chiral magnetic configurations. When allied with physical and chemical TEM analysis of both planar and cross-sectional samples, key length scales such as grain size and the chiral variation of the magnetisation variation have been identified and measured. We present data showing the importance of the grain size (mostly < 10 nm) measured from direct imaging and its potential role in describing observed behaviour of isolated skyrmions (diameter < 100 nm). In the latter the region in which the magnetization rotates is measured to be around 30 nm. Such quantitative information on the multiscale magnetisation variations in the system is key to understanding and exploiting the behaviour of skyrmions for future applications in information storage and logic devices.
登录
查看更多内容
影响因子:
3.8
作者:
Duckworth, Thomas A.;Ogrin, Feodor;van der Laan, Gerrit
通讯作者:
van der Laan, Gerrit
影响因子:
4.6
作者:
Franken JH;Herps M;Swagten HJ;Koopmans B
通讯作者:
Koopmans B
影响因子:
1.6
作者:
Vansteenkiste, Arne;Leliaert, Jonathan;Van Waeyenberge, Bartel
通讯作者:
Van Waeyenberge, Bartel
影响因子:
56.9
作者:
Jiang, Wanjun;Upadhyaya, Pramey;Hoffmann, Axel
通讯作者:
Hoffmann, Axel
影响因子:
16.6
作者:
Chen, Gong;Ma, Tianping;Schmid, Andreas K.
通讯作者:
Schmid, Andreas K.