Fabrication of colloidal gold micro-patterns using photolithographed self-assembled monolayers as templates
Fabrication of colloidal gold micro-patterns using photolithographed self-assembled monolayers as templates
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DOI：
10.1016/s0040-6090(98)00623-3
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发表时间：
1998-08-31
期刊：
影响因子：
2.1
通讯作者：
Chen, DY
中科院分区：
文献类型：
--
作者：
Liu, JF;Zhang, LG;Chen, DY
本文提供了一种自组装单层图案化金属化的新方法。在 SiO2 涂层的硅基板上的 (3-巯基丙基)-三甲氧基硅烷 (MTS) 的光刻自组装单层 (SAM) 上形成胶体金微图案。扫描电子显微镜 (SEM) 证实，胶体金紧密地复制了掩模特征。原子力显微镜(AFM)显示，未辐照的(3-巯基丙基)-三甲氧基硅烷单层上的胶体金颗粒相互连接，形成了几乎连续的单层金纳米颗粒。 X射线光电子显微镜（XPM）显示，暴露区域中MTS单层的-SH端基被氧化，胶体Au通过Au-S共价键自组装到未暴露区域。本方法可适用于微电子电路和微生物传感器的组装。 (C) 1998 Elsevier Science S.A. 保留所有权利。
This paper provides a new method for the patterned metallization of self-assembled monolayers. Colloidal Au micropatterns were formed on photolithographed self-assembled monolayers (SAMs) of (3-mercaptopropyl)-trimethoxysilane (MTS) on SiO2-coated Si substrates. As confirmed by scanning electron microscopy (SEM), the colloidal Au closely replicated the mask features. Atomic force microscopy (AFM)showed that the colloidal Au particles on the unirradiated monolayers of (3-mercaptopropyl)-trimethoxysilane were connected and an almost continuous monolayer of Au nanoparticles was formed. X-ray photoelectron microscopy (XPM) revealed that the -SH terminal groups of the MTS monolayer in the exposed region were oxidized and the self-assembly of colloidal Au onto the unexposed region were through Au-S covalent bounding. The present approach may be applicable to assembly of microelectronic circuits and microbiosensors. (C) 1998 Elsevier Science S.A. All rights reserved.