Comparative study of ferroelectric (K,Na)NbO3 thin films pulsed laser deposition on platinum substrates with different orientation
Comparative study of ferroelectric (K,Na)NbO3 thin films pulsed laser deposition on platinum substrates with different orientation
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DOI：
10.1109/isaf.2016.7578063
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发表时间：
2016-09
期刊：
影响因子：
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通讯作者：
Rika Tamano;Yoko Takada;N. Okamoto;Takeyasu Saito;K. Higuchi;A. Kitajima;T. Yoshimura;N. Fujimura
中科院分区：
文献类型：
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作者：
Rika Tamano;Yoko Takada;N. Okamoto;Takeyasu Saito;K. Higuchi;A. Kitajima;T. Yoshimura;N. Fujimura
采用脉冲激光沉积法在Pt（111）和Pt（100）底电极上制备了（K，Na）NbO 3（KNN）铁电电容器。还研究了O2中的退火效应。KNN薄膜在Pt（100）衬底上的晶粒比在Pt（111）衬底上的晶粒明显。Pt/KNN/Pt（111）在400°C和600°C下的2 Pr和2 Vc分别为4.28和4.58 μC/cm 2以及1.21和0.469 V。Pt/KNN/Pt（100）电容器在710°C下的2 Pr和2 Vc分别为27.7 μC/cm 2和4.05 V（施加电压为5 V）。分别
We fabricated ferroelectric (K,Na)NbO3 (KNN) capacitors on Pt(111) or Pt(100) bottom electrodes with different substrate temperature by pulsed laser deposition. The annealing effect in O2 was also investigated. KNN film on Pt(100) substrate exhibited crystal grain clearly than that on Pt(111). The 2Pr and 2Vc, measured by ferroelectric tester, of Pt/KNN/Pt(111) for 400°C and 600°C were 4.28 and 4.58 μC/cm2 and 1.21 and 0.469 V, respectively at applied voltage of 1 V. The 2Pr and 2Vc of Pt/KNN/Pt(100) capacitors for 710°C were 27.7 μC/cm2 and 4.05 V at applied voltage of 5 V, respectively.