Vacancy-Type Defects in Ion-Implanted Diamonds Probed by Monoenergetic Positron Beams
Vacancy-Type Defects in Ion-Implanted Diamonds Probed by Monoenergetic Positron Beams
复制标题
单能正电子束探测离子注入金刚石中的空位型缺陷
DOI:
10.1143/jjap.34.1772
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发表时间:
1995
影响因子:
1.5
通讯作者:
S. Shikata
中科院分区:
文献类型:
--
作者:
A. Uedono;T. Kawano;S. Tanigawa;R. Suzuki;T. Ohdaira;T. Mikado;S. Fujii;S. Shikata
Vacancy-type defects introduced by 180-keV B+-, C+- and N+-ion implantation in synthesized diamonds (type Ib) were probed by the positron annihilation technique. For an unimplanted specimen, the diffusion length of positrons was shorter and the lifetime of positrons was longer than those for a type IIa specimen. These facts were attributed to the trapping or the scattering of positrons by nitrogen-related defects. For ion-implanted specimens, the depth distributions of vacancy-type defects were determined from measurements of Doppler broadening profiles of the annihilation radiation as a function of incident positron energy. The obtained profiles of defects were in agreement with those of an energy loss of ions calculated by the Monte Carlo method. From measurements of lifetime spectra of positrons, the dominant defect species introduced by the B+- or N+-ion implantation were identified as complexes of vacancy clusters and these impurities.