Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
Spectroscopic Measurements of the Production and the Transport of CH Radicals in a Methane Plasma Used for the CVD of a-C:H
复制标题
用于 a-C:H CVD 的甲烷等离子体中 CH 自由基的产生和传输的光谱测量
DOI：
10.1143/jjap.29.2156
复制
发表时间：
1990
期刊：
影响因子：
--
通讯作者：
H. Harima
中科院分区：
文献类型：
--
作者：
K. Tachibana;Takuya Mukai;A. Yuuki;Y. Matsui;H. Harima
利用光发射光谱和激光诱导荧光光谱研究了甲烷射频放电沉积非晶碳膜过程中CH自由基的时空变化。从激发的A2Δ态的CH发射的时间变化表明，电子能量被深调制的rf场。CH在基态X2Π态的空间分布比CH的时间平均发射分布（A2Δ）更宽，表明CH（X2Π）及其扩散输运的空间产生模式更宽。还获得了CH的绝对密度（X2），由此估计CH到基底上的通量。CH的密度和空间分布受到稀释Ar气体的强烈影响。这些结果进行了比较，与模拟和讨论有关的薄膜沉积。
Spatial and temporal variations of CH radicals in an rf discharge in methane for the deposition of amorphous carbon film were measured by optical emission spectroscopy and laser-induced fluorescence (LIF) spectroscopy. The temporal variation of CH emission from the excited A2Δ state suggested that the electron energy was deeply modulated by the rf field. The spatial distribution of CH in the ground X2Π state showed a broader profile than the time-averaged emission profile of CH(A2Δ), indicating the broader spatial production pattern for the CH(X2Π) and its diffusional transport. The absolute density of CH(X2Π) was also obtained, from which the flux of CH onto the substrate was estimated. The density and the spatial profile of CH were strongly affected by diluent Ar gas. These results were compared with a simulation and discussed in relation to the film deposition.