Effect of Microstructure on the Electrical Properties of Nano-Structured TiN Coatings Deposited by Vacuum Cold Spray
Effect of Microstructure on the Electrical Properties of Nano-Structured TiN Coatings Deposited by Vacuum Cold Spray
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DOI：
10.1007/s11666-010-9541-9
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发表时间：
2010-08
影响因子：
3.1
通讯作者：
Y. Wang;Y. Liu;G. Yang;J. Feng;K. Kusumoto
中科院分区：
文献类型：
--
作者：
Y. Wang;Y. Liu;G. Yang;J. Feng;K. Kusumoto
Al2O3 基底上的 TiN 涂层是在室温 (RT) 下使用尺寸为 20 nm 的超细起始陶瓷粉末通过真空冷喷涂 (VCS) 工艺制造的。通过扫描电子显微镜、透射电子显微镜和X射线衍射对样品进行微观结构分析。使用四点探针测量 VCS TiN 涂层的薄层电阻。研究了微观结构对涂层电性能的影响。研究发现TiN涂层的方块电阻和电阻率与喷涂距离、喷嘴移动速度和沉积室压力显着相关。最小方块电阻达到 127 Ω。微观结构的变化与 TiN 涂层的电阻率相关。
TiN coatings on Al2O3substrates were fabricated by vacuum cold spray (VCS) process using ultrafine starting ceramic powders of 20 nm in size at room temperature (RT). Microstructure analysis of the samples was carried out by scanning electron microscopy, transmission electron microscopy, and x-ray diffraction. Sheet resistance of the VCS TiN coatings was measured with a four-point probe. The effects of microstructure on the electrical properties of the coatings were investigated. It was found that the sheet resistance and electrical resistivity of TiN coatings were significantly associating with the spray distance, nozzle traversal speed, and deposition chamber pressure. A minimum sheet resistance of 127 Ω was achieved. The microstructural changes can be correlated to the electrical resistivity of TiN coatings.