Surface smoothing with large current cluster ion beam
Surface smoothing with large current cluster ion beam
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DOI：
10.1016/j.nimb.2003.11.078
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发表时间：
2004-02-01
影响因子：
1.3
通讯作者：
Matsuo, J
中科院分区：
文献类型：
--
作者：
Seki, T;Matsuo, J
一个团簇是由几个到几千个原子组成的。当组成簇离子的多个原子轰击一个局部区域时，可实现高密度能量沉积和多次碰撞过程。由于相互作用，簇离子束工艺可以产生新的表面修饰效果，如表面光滑、高速率溅射和极浅注入。特别是簇束离子束可以使金刚石薄膜表面光滑，这是一种非常坚硬的材料，通常的离子加工方法很难加工。利用簇离子束实现硬材料的纳米级光顺和刻蚀需要高离子剂量，需要大电流来提高加工生产率。为了实现大电流簇束离子束，研究了簇束的产生，束电流达到600mua。采用紧凑的飞行时间（TOF）系统测量了大电流氩束离子束的尺寸分布。大电流簇离子束可使金刚石膜表面光滑，表面粗糙度（R-a）由32 nm变为5.1 nm。(C) 2003 Elsevier B.V.版权所有
A cluster is an aggregate of a few to several thousands atoms. When many atoms constituting a cluster ion bombard a local area, high-density energy deposition and multiple-collision processes are realized. Because of the interactions, cluster ion beam processes can produce new surface modification effects, such as surface smoothing, high rate sputtering and very shallow implantation. Especially, the cluster ion beam can smooth surfaces of diamond films that are very hard materials and difficult to machining with usual ion processes. High ion dose is needed to realize the nano-level smoothing and etching of hard materials using cluster ion beam and large current is needed to increase the productivity of processing. In order to achieve large current cluster ion beam, the cluster generation was studied and the beam current reached 600 muA. The size distributions of large current Ar cluster ion beams were measured using compact time-of-flight (TOF) system. A surface of diamond film could be smoothed with the large current cluster ion beam and the surface roughness (R-a) became 5.1 nm from 32 nm. (C) 2003 Elsevier B.V. All rights reserved.