Protected catalyst growth of graphene and carbon nanotubes
Protected catalyst growth of graphene and carbon nanotubes
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DOI：
10.1016/j.carbon.2019.04.030
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发表时间：
2019-08
期刊：
影响因子：
10.9
通讯作者：
Muhammad Ahmad;J. Anguita;C. Ducati;J. D. Carey;S. Silva
中科院分区：
文献类型：
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作者：
Muhammad Ahmad;J. Anguita;C. Ducati;J. D. Carey;S. Silva
石墨烯和碳纳米管应用中的一些关键挑战与它们与底物的附着性差以及生长阶段之前环境污染对催化剂的毒害有关。在这里，我们报告了一种“保护催化剂”技术，它不仅克服了这些挑战，而且提供了一种新的材料生产路线，与碳纳米材料的许多应用相兼容。这项突破性技术包括在催化剂上盖上一层合适材料（例如TiN， Cr, Ta）的保护层，保护催化剂免受环境污染物（如氧化，蚀刻侵蚀等）的影响，同时为所需纳米材料的CVD生长保持催化剂的碳供应。在cf4基反应刻蚀SiO2的过程中，由于有封盖层的存在，使得较薄的Fe催化剂层得到了保护。我们表明，使用这种技术生长的碳纳米结构在超声浴测试中表现出明显改善的对基底的附着力。我们展示了3D结构的制造和碳纳米管为基础的孔在埋催化剂安排使用保护催化剂技术。该技术还可以更好地控制各种生长参数，如石墨烯层数、生长速率、形貌和结构质量。
Some of the key challenges in the applications of graphene and carbon nanotubes are associated with their poor attachment to the substrate and poisoning of the catalyst by environmental contamination prior to the growth phase. Here we report a ‘protected catalyst’ technique which not only overcomes these challenges but also provides a new material production route compatible with many applications of carbon nanomaterials. The breakthrough technique involves capping the catalyst with a protective layer of a suitable material (examples include TiN, Cr, Ta) which protects the catalyst from environmental contaminants such as oxidation, etchant attack, etc., whilst maintaining carbon supply to the catalyst for the CVD growth of desired nanomaterial. A thin Fe catalyst layer remained protected due to the capping layer in the CF4based reactive-ion-etching of SiO2. We show that the carbon nanostructures grown using this technique exhibit significantly improved adhesion to the substrate in sonication bath tests. We demonstrate the fabrication of 3D structures and CNT based vias in a buried catalyst arrangement using the protected catalyst technique. The technique also allows better control over various growth parameters such as number of graphene layers, growth rate, morphology, and structural quality.