Atomic spin decoherence near conducting and superconducting films (4 pages)

Atomic spin decoherence near conducting and superconducting films (4 pages)
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导电和超导薄膜附近的原子自旋退相干(4 页)

DOI:
10.1103/physreva.72.042901
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发表时间:
2005
期刊:
影响因子:
2.9
通讯作者:
E. Hinds
E. Hinds
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
S. Scheel;P. Rekdal;P. Knight;E. Hinds

文献摘要

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我们推导了被困在导电和超导平面附近的中性原子的自旋退相干的标度定律。薄膜的结果揭示了yj . Lin, I. Teper, C. Chin和V. Vuletic[物理学]的测量。Rev. Lett. 92, 050404(2004)]。我们的计算是基于对金属体附近电磁辐射的量子理论处理[P。K. Rekdal, S. Scheel, P. L. Knight和E. A. Hinds,物理学家。生物工程学报,2004,32(1):1 - 4。我们证明了存在一个临界的原子表面距离,使自旋弛豫速率最大化,并且我们证明了这如何取决于金属表面的蒙皮深度和厚度。根据这种阻抗匹配效应,我们讨论了薄超导铌层上预期的自旋弛豫。
We derive scaling laws for the spin decoherence of neutral atoms trapped near conducting and superconducting plane surfaces. A result for thin films sheds light on the measurement of Y. J. Lin, I. Teper, C. Chin, and V. Vuletic [Phys. Rev. Lett. 92, 050404 (2004)]. Our calculation is based on a quantum-theoretical treatment of electromagnetic radiation near metallic bodies [P. K. Rekdal, S. Scheel, P. L. Knight, and E. A. Hinds, Phys. Rev. A 70, 013811 (2004)]. We show that there is a critical atom-surface distance that maximizes the spin relaxation rate and we show how this depends on the skin depth and thickness of the metal surface. In the light of this impedance-matching effect we discuss the spin relaxation to be expected above a thin superconducting niobium layer.