Head and bit patterned media optimization at areal densities of 2.5Tbit/in2 and beyond

Head and bit patterned media optimization at areal densities of 2.5Tbit/in2 and beyond
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面密度为 2.5Tbit/in2 及以上的头和位图案介质优化

DOI:
10.1016/j.jmmm.2010.11.081
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发表时间:
2012
影响因子:
2.7
通讯作者:
Bashir M
Bashir M
中科院分区:
材料科学3区
文献类型:
--
作者:
Bashir M

文献摘要

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采用微磁学和替代优化方法对磁头进行了全局优化。磁极尖端的形状针对比特图案化的交换弹簧记录介质进行了优化。介质特性定义了有效写入场和作用于相邻磁道中的岛的磁头场的阈值。一旦定义了所需的磁头场特性,就优化极尖几何形状,以便实现有效写入场的高梯度,同时保持相邻磁道处的写入场低于给定值。我们计算了多层梯度介质中不同最大各向异性的写入错误率和相邻磁道擦除。结果表明,擦除前的错误率和通过的数量之间的线性权衡。对于最佳的磁头介质组合,我们发现在2.5Tbit/in 2的擦除前,108条通道的误码率为10− 6。
Global optimization of writing head is performed using micromagnetics and surrogate optimization. The shape of the pole tip is optimized for bit patterned, exchange spring recording media. The media characteristics define the effective write field and the threshold values for the head field that acts at islands in the adjacent track. Once the required head field characteristics are defined, the pole tip geometry is optimized in order to achieve a high gradient of the effective write field while keeping the write field at the adjacent track below a given value. We computed the write error rate and the adjacent track erasure for different maximum anisotropy in the multilayer, graded media. The results show a linear trade off between the error rate and the number of passes before erasure. For optimal head media combinations we found a bit error rate of 10−6with 108pass lines before erasure at 2.5Tbit/in2.