Tendency of Loop Formation of Oligosilsesquioxanes Obtained from (4-Substituted phenyl)trimethoxysilane Catalyzed by Benzyltrimethylammonium Hydroxide in Benzene
Tendency of Loop Formation of Oligosilsesquioxanes Obtained from (4-Substituted phenyl)trimethoxysilane Catalyzed by Benzyltrimethylammonium Hydroxide in Benzene
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DOI：
10.1295/polymj.36.455
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发表时间：
2004-06
期刊：
影响因子：
2.8
通讯作者：
C. Pakjamsai;Y. Kawakami
中科院分区：
文献类型：
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作者：
C. Pakjamsai;Y. Kawakami
采用基质辅助激光解吸/电离飞行时间质谱法研究了苯中（4-取代苯基）三甲氧基硅烷在苯基三甲基氢氧化铵存在下的水解产物。在反应4 h的苯可溶组分中，观察到含有6 ~ 9个硅原子的低聚硅氧烷，有或没有环。（4-二甲氨基苯基）三甲氧基硅烷中含有6个硅原子的组分最少（3%），含有9个硅原子的组分最多（36%）。在[4-甲氧基-(10%)、4-甲基-(22%)、非-(3%)和4-苯基-(13%)取代苯基]三甲氧基硅烷的产物中，形成含9个硅原子的低聚硅氧烷最少。含有6 ~ 8个硅原子的低聚硅氧烷是产物的主要成分，与取代基无关。S8的最大缩合度(f)为0.8，未发现完全缩合的结构。最大f=1.00， S9为完全闭环，仅剩1个OH基团。
Products in hydrolysis of (4-substituted phenyl)trimethoxysilane in the presence of benzyltrimethylammonium hydroxide in benzene was studied by matrix-assisted laser desorption/ionization-time of flight mass spectroscopy. In the benzene soluble fraction of 4 h reaction, oligosilsesquioxanes containing 6 to 9 silicon atoms with or without loops were observed. (4-Dimethylaminophenyl)trimethoxysilane gave the fraction containing 6 silicon atoms the least (3%), and 9 silicon fraction the most (36%). Oligosilsesquioxanes containing 9 silicon atoms were formed the least among the products for [4-methoxy- (10%), 4-methyl- (22%), non- (3%), and 4-phenyl- (13%) substituted phenyl]trimethoxysilanes. Oligosilsesquioxanes containing 6 to 8 silicon atoms were the major components of the product irrespective of the substituent. Maximum degree of condensation (f) was 0.8 for S8, and fully condensed structure was not found. The maximum f=1.00, and completely closed loop was found in S9 with one OH group remaining.