Origin of platelike granular structure for the ultrananocrystalline diamond films synthesized in H2-containing Ar/CH4 plasma
Origin of platelike granular structure for the ultrananocrystalline diamond films synthesized in H2-containing Ar/CH4 plasma
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DOI：
10.1063/1.3296187
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发表时间：
2010-02
影响因子：
3.2
通讯作者：
Chuan-Sheng Wang;Huang-Chin Chen;H. Cheng;I. Lin
中科院分区：
文献类型：
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作者：
Chuan-Sheng Wang;Huang-Chin Chen;H. Cheng;I. Lin
系统地研究了 Ar/CH4 等离子体中掺入 H2 物质对金刚石薄膜微观结构的影响。无氢等离子体产生等轴晶粒（尺寸约5 nm）的超纳米晶金刚石薄膜，而含氢等离子体产生板状晶粒（尺寸约100×300 nm2）。板状晶粒的尺寸随着等离子体中H2含量的增加而增加。透射电子显微镜和光学发射光谱表明，Ar/CH4 等离子体中仅掺入 0.1%H2 就足以诱导板状晶粒的形成，这表明板状晶粒是通过碳氢化合物在现有金刚石表面上的附着和蚀刻之间的竞争而形成的。在Ar等离子体中，金刚石晶粒总是被碳氢化合物钝化，等离子体中的活性碳物质只能再核形成纳米晶金刚石晶粒。在等离子体中掺入 H2 物质会导致部分电...
The modification on microstructure of diamond films due to the incorporation of H2 species into the Ar/CH4 plasma was systematically investigated. While the hydrogen-free plasma produced the ultrananocrystalline diamond films with equiaxed grains (about 5 nm in size), the hydrogen-containing plasma resulted in platelike grains (about 100×300 nm2 in size). The size of the platelike grains increased with the H2 content in the plasma. Transmission electron microscopy and optical emission spectroscopy reveal that only 0.1%H2 incorporated in the Ar/CH4 plasma is sufficient for inducing the formation of platelike grains, suggesting that the platelike grains are formed via the competition between the attachment and the etching of hydrocarbons onto the existing diamond surfaces. In Ar plasma, the diamond grains were always passivated with hydrocarbons and the active carbon species in the plasma can only renucleate to form nanocrystalline diamond grains. Incorporation of H2 species in the plasma leads to partial e...