Palladium Ultrathin Film Growth by Surface-Limited Redox Replacement of Cu and H UPD Monolayers: Approaches, Pros, Cons, and Comparison
Palladium Ultrathin Film Growth by Surface-Limited Redox Replacement of Cu and H UPD Monolayers: Approaches, Pros, Cons, and Comparison
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DOI：
10.1149/2.f06182if
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发表时间：
2018
期刊：
影响因子：
--
通讯作者：
N. Dimitrov;Innocent Achari;S. Ambrozik
中科院分区：
文献类型：
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作者：
N. Dimitrov;Innocent Achari;S. Ambrozik
