Diagnostics of microdischarge-integrated plasma sources for display and materials processing
Diagnostics of microdischarge-integrated plasma sources for display and materials processing
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DOI：
10.1088/0741-3335/47/5a/012
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发表时间：
2005-05
影响因子：
2.2
通讯作者：
K. Tachibana;Y. Kishimoto;S. Kawai;T. Sakaguchi;O. Sakai
中科院分区：
文献类型：
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作者：
K. Tachibana;Y. Kishimoto;S. Kawai;T. Sakaguchi;O. Sakai
两种不同类型的微放电集成等离子体源已在大气压范围内操作。利用发射光谱、激光吸收光谱和微波透射光谱等技术对放电特性进行了诊断。利用OES和LAS分析了激发态原子的动态时空行为，并利用MT方法估计了电子密度的时间行为。在Ar和Ar/Ne气体中，MT信号的波形在上升期跟随电流波形，并且根据复合损失持续更长时间。然而，在他的波形遵循密度的亚稳态原子，反映了大量的电子的生产与杂质的潘宁电离过程。这些等离子体源中的估计峰值电子密度为1012 cm−3，亚稳态原子密度可达1013 cm−3。因此，建议这些源可以潜在地应用于在大气压下稳定操作的大面积的方便的材料处理工具。
Two different types of microdischarge-integrated plasma sources have been operated at around the atmospheric pressure range. The discharge characteristics were diagnosed by optical emission spectroscopy (OES), laser absorption spectroscopy (LAS) and microwave transmission (MT) techniques. The dynamic spatiotemporal behaviour of excited atoms was analysed using OES and LAS and the temporal behaviour of the electron density was estimated using the MT method. In Ar and Xe/Ne gases, waveforms of the MT signal followed the current waveform in the rise period and lasted longer according to the recombination losses. However, in He the waveform followed the density of metastable atoms, reflecting the production of a large amount of electrons by the Penning ionization process with impurities. The estimated peak electron density in those plasma sources is of the order of 1012 cm−3, and the metastable atom density can reach 1013 cm−3. Thus, it is suggested that these sources can be potentially applied to convenient material processing tools of large area operated stably at atmospheric pressure.