Nanosecond pulsed plasma discharge over a flowing water film: Characterization of hydrodynamics, electrical, and plasma properties and their effect on hydrogen peroxide generation
Nanosecond pulsed plasma discharge over a flowing water film: Characterization of hydrodynamics, electrical, and plasma properties and their effect on hydrogen peroxide generation
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DOI：
10.1002/ppap.201800008
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发表时间：
2018-06
影响因子：
3.5
通讯作者：
R. Wandell;Huihui Wang;K. Tachibana;Basiel Makled;B. Locke
中科院分区：
文献类型：
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作者：
R. Wandell;Huihui Wang;K. Tachibana;Basiel Makled;B. Locke
一个连续流动的液膜反应器驱动的可变纳秒脉冲电源，其中产生的等离子体通道在氩气中传播沿着的水膜，被用来评估输出电压设置，脉冲频率，和气体/液体流速上产生的H2 O2的影响。增加电压显著影响放电电流，导致更热/更密集的等离子体通道，这增加了过氧化氢的产生速率，但降低了能量产率。脉冲频率和气体/液体流速的变化对电气和等离子体性能的影响不大，然而，生产的H2 O2每脉冲减少脉冲频率的增加，并被证明是链接到不足的化学和/或热耗散的气相脉冲之间。
A continuously flowing liquid film reactor driven by a variable nanosecond pulsed power supply, where plasma channels generated in argon propagate along the water film, was utilized to assess the effects of output voltage setting, pulse frequency, and gas/liquid flow rate on the generation of H2O2. Increasing the voltage significantly impacted the discharge current, resulting in hotter/denser plasma channels that increased the production rate of hydrogen peroxide but lowered the energy yield. Variation in pulse frequency and gas/liquid flow rates had little impact on electrical and plasma properties, however, the production of H2O2per pulse decreased with increasing pulse frequency and was shown to be linked to insufficient chemical and/or thermal dissipation of the gas phase between pulses.