Deposition of poly‐p‐xylylene films by plasma decomposition of cyclodi‐p‐xylylene
Deposition of poly‐p‐xylylene films by plasma decomposition of cyclodi‐p‐xylylene
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环二对二甲苯等离子体分解沉积聚对二甲苯薄膜
DOI：
10.1002/app.1995.070570112
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发表时间：
1995
影响因子：
3
通讯作者：
P. N. Grakovich
中科院分区：
文献类型：
--
作者：
A. M. Krasovsky;E. M. Tolstopyatov;P. N. Grakovich
聚对二甲苯（PPX）膜和涂层通常通过戈勒姆方法制备。该方法基于环状二聚体二苯二甲撑（DPX）在低压（10 ~ 100 Pa）下于热壁（约870 K）上热解为活性对苯二甲撑（PX）单体。在热解反应器中产生的PX通过冷却区到达沉积室，冷凝，并在约300 K或更低的温度下在表面上聚合。然而，热解并不是气态多原子分子分解的唯一可能方法。众所周知，这一过程也发生在辉光放电等离子体中。本文所述工作的目的是研究在单体生成阶段通过DPX的等离子体分解来沉积PPX膜的可能性。
Poly-p-xylylene (PPX) films and coatings have usually been prepared by the Gorham method.’The method is based on pyrolytic decomposition of the cyclic dimer, dip-xylylene (DPX), to the active p-xylylene (PX) monomer on a hot wall (about 870 K) under low pressure (between 10 and 100 Pa). PX generated in the pyrolytic reactor passes through the cooling zone to the deposition chamber, condenses, and polymerizes on surfaces at a temperature of about 300 K or lower.However, pyrolysis is not the only possible method of decomposition of multiatomic molecules in the gaseous state. It is well known that this process also takes place in glow-discharge plasma. The aim of the work described here was to study the possibility of PPX film deposition by plasma decomposition of DPX at the stage of monomer generation.