Structure and deuterium retention properties of tungsten layers deposited by plasma sputtering in a mixed atmosphere of D2 and He
Structure and deuterium retention properties of tungsten layers deposited by plasma sputtering in a mixed atmosphere of D2 and He
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DOI：
10.1016/j.jnucmat.2013.12.008
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发表时间：
2014-03
影响因子：
3.1
通讯作者：
X. Tang;Liqun Shi;D. J. O'connor;B. King
中科院分区：
文献类型：
--
作者：
X. Tang;Liqun Shi;D. J. O'connor;B. King
研究了沉积条件对D2、He、Ar混合气氛中射频磁控等离子体溅射形成的钨层表面形貌、晶体结构和氘保留的影响。 Cu/Si 基底上的含氦氘化钨层（称为 He-WDx）表现出严重的薄膜损伤，包括裂纹、断裂、剥落和大表面气泡区域。然而，由于衬底的表面粗糙度较大，在机械抛光的多晶铜衬底上进行的 He-WDx 层不会发生此类损坏。随着层中He的添加，W层的晶体结构发生了很大的变化，并且在W晶体中产生了大量的缺陷，导致晶格膨胀和X衍射峰展宽。 W层中的He对D保留有直接影响。 D 和 He 浓度随 He 分数、附加负偏压和基底温度同时变化。
The influence of the deposition conditions on the surface morphology, crystal structure and deuterium retention of the tungsten layers formed by rf magnetron plasma sputtering in mixed atmosphere of D2, He and Ar, has been carried out. Helium containing deuterated tungsten layers (named He-WDx) on Cu/Si substrate demonstrate serious film damages with zones of cracks, fractures, flaking-off and large surface blisters. However, these kinds of damages do not happen on the He-WDxlayers performed on mechanically polished polycrystalline Cu substrates because of larger surface roughness of the substrates. The crystal structure of the W layer greatly changes with the additional He in the layer, and large amounts of defects resulting in lattice expansion and X-diffraction peak broadening were produced in the W crystal. He in the W layer has direct impacts on D retention. Both D and He concentrations vary simultaneously with He fraction, attached negative bias and substrate temperature.