Cobalt electrodeposition using urea and choline chloride

Cobalt electrodeposition using urea and choline chloride
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DOI:
10.1016/j.electacta.2014.01.052
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发表时间:
2014-03-20
影响因子:
6.6
通讯作者:
Reddy, Ramana G.
Reddy, Ramana G.
中科院分区:
材料科学2区
文献类型:
--
作者:
Li, Min;Wang, Zhaowen;Reddy, Ramana G.

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采用循环伏安法研究了Co(II)在尿素-氯化胆碱-CoCl 2熔体中的电化学行为。结果表明,Co(II)生成Co的反应是不可逆的,通过一步两电子转移过程进行。在373 K时,Co(II)的扩散系数估计为1.7 × 10(-6)cm(2)s(-1)。研究了在不同阴极电位(-0.80 ~-0.95V)和温度(353 ~ 383 K)下,在氯化胆碱和尿素(摩尔比1:2)的低共熔混合物中钴的电沉积。采用扫描电子显微镜(SEM)、能谱仪(EDS)和X射线衍射仪(XRD)对镀层进行了表征。SEM图像显示,在-0.80 V电压下,在353 ~ 373 K温度范围内,获得了均匀、致密、致密的沉积层。EDS和XRD分析证实,获得了高纯度的金属Co沉积物。(C)2014爱思唯尔有限公司版权所有。
The electrochemical behavior of Co(II) in urea-choline chloride-CoCl2 melt was investigated by cyclic voltammetry at 373 K. The results show that the reaction of Co(II) to Co is irreversible and it proceeds via a one-step two electrons transfer process. The diffusion coefficient of Co(II) was estimated to be 1.7 x 10(-6) cm(2) s(-1) at 373 K. Electrodeposition of cobalt was studied at different cathodic potentials (-0.80 to -0.95 V) and at different temperatures (353 to 383K) in eutectic mixture of choline chloride and urea (1:2 molar ratio). The deposits were characterized using scanning electron microscope (SEM), energy-dispersive spectroscopy (EDS), and X-ray diffraction (XRD). SEM images show that uniform, dense, and compact deposits were obtained at -0.80 V within a temperature range of 353 K to 373 K. EDS and XRD analysis confirm that high-purity metallic Co deposits were obtained. (C) 2014 Elsevier Ltd. All rights reserved.