Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
Superconducting niobium titanium nitride thin films deposited by plasma-enhanced atomic layer deposition
复制标题
等离子体增强原子层沉积超导铌钛氮化物薄膜
DOI：
10.1088/1361-6668/aa7ce3
复制
发表时间：
2017
影响因子：
3.6
通讯作者：
J. Provine
中科院分区：
文献类型：
--
作者：
Y. Yemane;M. Sowa;J. Zhang;L. Ju;E. Deguns;N. Strandwitz;F. Prinz;J. Provine
NbTiN具有多种超导应用，从射频腔到单光子探测器。在这里，我们系统地研究了NbxTi 1−x N与有机金属前体（t-丁基氨基）、三（二乙胺）、铌(V)和四（二甲胺）钛的等离子体增强原子层沉积（PEALD），并结合远程H2/N2等离子体。在每个ALD超循环中，沉积薄膜的性能被研究为Nb与Ti前驱脉冲比值的函数。采用椭偏光谱（厚度、光学性质）、四点探针（电阻率）、x射线光电子能谱（成分）、x射线反射率（密度和厚度）、x射线衍射（结晶度）和超导性测量对PEALD NbTiN薄膜进行了表征。与通过热ALD或溅射沉积超导薄膜相比，PEALD工艺显示出明显的优势，例如更低的加工温度和更有效地控制薄膜成分。这种对薄膜成分的控制使得电学和超导性能得以调整，例如将超导临界温度TC在6.9和13.2 K之间变化。
NbTiN has a variety of superconducting applications, ranging from RF cavities to single-photon detectors. Here, we systematically investigated the plasma-enhanced atomic layer deposition (PEALD) of NbxTi 1 − x N with the organometallic precursors (t-butylimido) tris(diethyamido) niobium(V) and tetrakis (dimethylamido) titanium in conjunction with a remote H2/N2 plasma. Deposited film properties have been studied as a function of the ratio of Nb to Ti precursor pulses within each ALD supercycle. PEALD NbTiN films were characterized with spectroscopic ellipsometry (thickness, optical properties), four point probe (resistivity), x-ray photoelectron spectroscopy (composition), x-ray reflectivity (density and thickness), x-ray diffraction (crystallinity), and superconductivity measurements. The PEALD process has shown distinct advantages over deposition of superconducting films via thermal ALD or sputtering, for example a lower processing temperature and more efficient control of film composition. This control of film composition enabled the tuning of electrical and superconducting properties, such as varying the superconducting critical temperature TC between 6.9 and 13.2 K.