Femtosecond laser-induced damage and filamentary propagation in fused silica
Femtosecond laser-induced damage and filamentary propagation in fused silica
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DOI：
10.1103/physrevlett.89.186601
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发表时间：
2002-10-28
影响因子：
8.6
通讯作者：
Mysyrowicz, A
中科院分区：
文献类型：
--
作者：
Sudrie, L;Couairon, A;Mysyrowicz, A
对飞秒红外激光脉冲在二氧化硅中引起的体损伤进行了实验和数值研究。在强聚焦几何结构中，第一损伤区后面紧跟着一条亚微米宽的窄轨道，表明是丝状传播。损伤轨迹的形状和大小与光场电离和雪崩产生的电子密度接近10(20)cm(-3)的区域相对应。研究了雪崩和光致电离的相对作用。脉冲后产生的等离子体密度在2-4×10(20)cm(-3)附近饱和。
Bulk damage induced by fs IR laser pulses in silica is investigated both experimentally and numerically. In a strong focusing geometry, a first damage zone is followed by a narrow track with submicron width, indicating a filamentary propagation. The shape and size of the damage tracks are shown to correspond to the zone where the electron density created by optical field ionization and avalanche is close to 10(20) cm(-3). The relative role of avalanche and photoionization is studied. The plasma density produced in the wake of the pulse is shown to saturate around 2-4x10(20) cm(-3).