Titanium atom densities in reactive rf magnetron sputtering for TiO2 deposition
Titanium atom densities in reactive rf magnetron sputtering for TiO2 deposition
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反应性射频磁控溅射 TiO2 沉积中的钛原子密度
DOI：
10.1116/1.1417539
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发表时间：
2002
期刊：
影响因子：
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通讯作者：
K. Okimura
中科院分区：
文献类型：
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作者：
Tadashi Nakamura;K. Okimura
通过原子吸收法研究了 Ar-O2 反应射频 (13.56 MHz) 磁控溅射中径向和轴向上的钛 (Ti) 原子密度，以了解晶体 TiO2 薄膜的生长条件。还测量了纯 Ar 放电中的 Ti 原子密度，以便与 Ar-O2 混合放电中的 Ti 原子密度进行比较。在总压为3.5 Pa、射频功率为200 W时，Ar-O2放电中Ti原子密度为(0.2–3.1)×109 cm−3，比测量区域纯Ar放电中的Ti原子密度[(0.2–2.2)×1011 cm−3]小两个数量级。另一方面，在总压为0.35 Pa的Ar-O2放电中，Ti原子密度为(0.2–2.9)×109 cm−3，而在0.35 Pa的纯Ar放电中，Ti原子密度为(0.1–1.0)×1010 cm−3。根据等离子体参数和纯Ar，解释了在Ar-O2和纯Ar中具有峰结构的Ti原子密度的径向分布。自偏置电压。
Titanium (Ti) atom densities on the radial and axial directions in Ar–O2 reactive rf (13.56 MHz) magnetron sputtering were investigated by an atomic absorption method for the conditions where crystalline TiO2 films grow. Ti atom densities in pure Ar discharge were also measured for comparison with those in the Ar–O2 mixture discharge. At a total pressure of 3.5 Pa and rf power of 200 W, the Ti atom densities in the Ar–O2 discharge were (0.2–3.1)×109 cm−3, two orders smaller than those [(0.2–2.2)×1011 cm−3] in pure Ar discharge in the measured region. On the other hand, the Ti atom densities in the Ar–O2 discharge at a total pressure of 0.35 Pa were (0.2–2.9)×109 cm−3, while those were (0.1–1.0)×1010 cm−3 in the pure Ar discharge at 0.35 Pa. Radial profiles of the Ti atom density with a peak structure in Ar–O2 and pure Ar were interpreted based on the plasma parameters and self-bias voltage.