New positive-type photosensitive polyimide having sulfo groups
New positive-type photosensitive polyimide having sulfo groups
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DOI：
10.1016/s0032-3861(03)00636-0
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发表时间：
2003-09
期刊：
影响因子：
4.6
通讯作者：
K. Morita;K. Ebara;Y. Shibasaki;M. Ueda;K. Goto;S. Tamai
中科院分区：
文献类型：
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作者：
K. Morita;K. Ebara;Y. Shibasaki;M. Ueda;K. Goto;S. Tamai
以1-{1，1-双[4-（2-重氮-1（2 H）萘酮-5-磺酰氧基）苯基]乙基}-4-{1-[4-（2-重氮-1（2 H）萘酮-5-磺酰氧基）苯基]甲基乙基}苯（S-DNQ）为光敏剂，合成了一种新型正性光敏聚酰亚胺（PSPI）。以1，3-苯二胺-4-磺酸（PDAS）、4，4 ′-二氨基二苯醚（ODA）和4，4 ′-六氟亚丙基双邻苯二甲酸酐（6 FDA）为原料，通过开环加成聚合，然后在间甲酚中热环化合成了PIS。含有30wt% S-DNQ的PIS在365 nm光下曝光，然后在室温下用2.38wt%四甲基氢氧化铵（TMAH）水溶液显影时，显示出100 mJcm-2的灵敏度和1.7的对比度。通过接触模式，在暴露于365 nm的200 mJcm-2紫外光的光致抗蚀剂膜上观察到具有10 μm线和间隔图案的精细正像。通过热处理将正像成功地转化为聚酰亚胺图案。
A new positive-working photosensitive polyimide (PSPI) has been developed, which is based on polyimide bearing sulfo groups (PIS) and 1-{1,1-bis[4-(2-diazo-1-(2H)naphthalenone-5-sulfonyloxy)phenyl]ethyl}-4-{1-[4-(2-diazo-1(2H)naphthalenone-5-sulfonyloxy)phenyl]methylethyl}benzene (S-DNQ) as a photosensitive compound. PIS was prepared by ring-opening polyaddition of 1,3-phenylenediamine-4-sulfonicacid (PDAS), 4,4′-oxydianiline (ODA), and 4,4′-hexafluoropropylidenebis(phthalic anhydride) (6FDA), followed by thermal cyclization in m-cresol. PIS containing 30wt% of S-DNQ showed a sensitivity of 100mJcm−2and a contrast of 1.7, when it was exposed to 365 nm light followed by developing with 2.38wt% aqueous tetramethylammonium hydroxide (TMAH) solution at room temperature. A fine positive image featuring 10 μm line and space patterns was observed on the film of the photoresist exposed to 200mJcm−2of UV-light at 365 nm by the contact mode. The positive image was successfully converted to the polyimide pattern by thermal treatment.