FABRICATION OF WELL-ORDERED INDIUM-TIN-OXIDE FILM AND CHARACTERIZATION OF ORGANIC FILMS VACUUM-DEPOSITED ON IT
FABRICATION OF WELL-ORDERED INDIUM-TIN-OXIDE FILM AND CHARACTERIZATION OF ORGANIC FILMS VACUUM-DEPOSITED ON IT
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有序氧化铟锡薄膜的制备及其真空沉积有机薄膜的表征
DOI：
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
M. Motoyama
中科院分区：
文献类型：
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作者：
T. Sakanoue;S. Nakatani;Y. Ueda;H. Izumi;T. Ishihara;M. Motoyama
采用脉冲激光沉积法在氧化钇稳定的氧化锆（YSZ）单晶的（100）面上制备了氧化铟锡（ITO）薄膜。用原子力显微镜和X射线衍射仪对ITO薄膜进行了表征。ITO在YSZ衬底上异质外延生长。ITO薄膜表面极其平坦，高度粗糙度小于1 nm。两种有机染料，铜酞菁和钒基四苯基卟啉，真空沉积在ITO基板上。通过透射电镜和电子衍射分析研究了它们在薄膜中的分子取向。
Indium-tin-oxide film (ITO) was fabricated on a (100) surface of an yttria-stabilized zirconia (YSZ) single crystal by pulsed laser deposition. The ITO film was characterized by atomic force microscopy and X-ray diffraction measurements. ITO grew heteroepitaxially on the YSZ substrate. The ITO film surface was extremely flat and roughness in height was less than 1 nm. Two organic dyes, copper phthalocyanine and vanadyltetraphenylporphyrin, were vacuum-deposited on the ITO substrate. Their molecular orientations in thin film were investigated by transmission electron microscopy and electron diffraction analysis.