Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry.
Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry.
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使用时间分辨等离子体成像和极紫外光谱法表征锡蒸气中的真空电弧放电。
DOI：
10.1103/physreve.71.026409
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发表时间：
2005
期刊：
影响因子：
--
通讯作者：
Konstantin N Koshelev
中科院分区：
文献类型：
--
作者：
E. Kieft;van der J.J.A.M. Mullen;Gmw Gerrit Kroesen;V. Y. Banine;Konstantin N Koshelev
锡蒸气放电源最近作为半导体光刻应用的候选极紫外 (EUV) 光源受到越来越多的关注，因为它们在 13.5 nm 附近具有有利的光谱。在 ASML EUV 实验室中，EUV 中的时间分辨针孔成像和可见光中的二维成像已应用于真空电弧锡蒸气放电演化的定性表征。 EUV 光谱仪已用于查找放电等离子体演化过程中锡的主要电离阶段随时间的变化。
Discharge sources in tin vapor have recently been receiving increased attention as candidate extreme ultraviolet (EUV) light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm. In the ASML EUV laboratory, time-resolved pinhole imaging in the EUV and two-dimensional imaging in visible light have been applied for qualitative characterization of the evolution of a vacuum-arc tin vapor discharge. An EUV spectrometer has been used to find the dominant ionization stages of tin as a function of time during the plasma evolution of the discharge.