Effect on dark matter exclusion limits from new silicon photoelectric absorption measurements

Effect on dark matter exclusion limits from new silicon photoelectric absorption measurements
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DOI:
10.1103/physrevd.104.063002
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发表时间:
2020-10
期刊:
影响因子:
5
通讯作者:
B. Krosigk;Matthew Wilson;Chris Stanford;B. Cabrera;R. Calkins;D. Jardin;N. Kurinsky;F. Ponce;Chih-Pan Wu
B. Krosigk;Matthew Wilson;Chris Stanford;B. Cabrera;R. Calkins;D. Jardin;N. Kurinsky;F. Ponce;Chih-Pan Wu
中科院分区:
物理与天体物理2区
文献类型:
--
作者:
B. Krosigk;Matthew Wilson;Chris Stanford;B. Cabrera;R. Calkins;D. Jardin;N. Kurinsky;F. Ponce;Chih-Pan Wu

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Recent breakthroughs in cryogenic silicon detector technology allow for the observation of single electron-hole pairs released via particle interactions within the target material. This implies sensitivity to energy depositions as low as the smallest band gap, which is $\sim1.2$\,eV for silicon, and therefore sensitivity to eV/$c^2$-scale bosonic dark matter and to thermal dark matter at masses below 100\,MeV/$c^2$. Various interaction channels that can probe the lowest currently accessible masses in direct searches are related to standard photoelectric absorption. In any of these respective dark matter signal models any uncertainty on the photoelectric absorption cross section is propagated into the resulting exclusion limit or into the significance of a potential observation. Using first-time precision measurements of the photoelectric absorption cross section in silicon recently performed at Stanford~University, this article examines the importance having accurate knowledge of this parameter at low energies and cryogenic temperatures for these dark matter searches.