Optical properties of SrMoO3 thin film
Optical properties of SrMoO3 thin film
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SrMoO3薄膜的光学特性
DOI：
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发表时间：
2000
期刊：
影响因子：
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通讯作者：
H. Kawazoe
中科院分区：
文献类型：
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作者：
H. Mizoguchi;N. Kitamura;K. Fukumi;T. Mihara;J. Nishii;M. Nakamura;N. Kikuchi;H. Hosono;H. Kawazoe
我们采用射频磁控反应溅射方法在石英玻璃基板上制备SrMoO3薄膜并评估其光学性能。蓝色薄膜的反射率由于等离激元而显示出约 1.7 eV 处的截止值。通过反射率的 Kramers-Kronig 分析，获得了介电常数和光学常数的光谱依赖性。他们与光谱椭圆光度法确定的常数趋于一致。通过将 Drude 模型应用于反射率值，获得了自由载流子产生的等离子体频率 (4.5 eV)，这表明传导载流子的有效质量为 m*=2.1m0，其中 m0 是自由电子质量。
We used an rf magnetron reactive sputtering method to prepare SrMoO3 thin film on a silica glass substrate and evaluated its optical properties. The reflectivity of the blue-colored film showed a cutoff due to plasmon at ∼1.7 eV. From a Kramers–Kronig analysis of the reflectivity, the spectral dependence of dielectric constants and optical constants were obtained. They agreed in tendency with the constants determined by spectroscopic ellipsometry. The plasma frequency due to free carriers (4.5 eV) was obtained by application of a Drude model to reflectivity values, which showed that the effective mass of the conduction carrier was m*=2.1m0, where m0 is the free electron mass.