Investigations of magnetic properties of Tb-doped Ni78Fe22 thin films

Investigations of magnetic properties of Tb-doped Ni78Fe22 thin films
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DOI：
10.1002/pssc.201084182
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发表时间：
2010
期刊：
2010 8th International Vacuum Electron Sources Conference and Nanocarbon
影响因子：
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通讯作者：
C. Luo;L. Sun;Y. Zhang;H. Huang;M. Yang;Y. Zhai;J. Du;H. Zhai
C. Luo;L. Sun;Y. Zhang;H. Huang;M. Yang;Y. Zhai;J. Du;H. Zhai
中科院分区：
其他
文献类型：
--
作者：
C. Luo;L. Sun;Y. Zhang;H. Huang;M. Yang;Y. Zhai;J. Du;H. Zhai

文献摘要

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本文研究了低掺杂Tb对Ni78Fe22薄膜磁性能的影响。用能量色散X射线荧光光谱仪(EDS)测定了薄膜的成分，用X射线衍射仪(X射线衍射仪)研究了不同Tb含量的薄膜的结构。采用振动样品磁强计(VSM)和铁磁共振(FMR)对样品的静态磁性能进行了测试。
In this research, the magnetic properties of Ni78Fe22 thin films by low doping of Tb additives are investigated. The composition of the films was determined by energy dispersive X-ray fluorescence spectrometer (EDS), and the structure of the films with different concentration of Tb was investigated by X-ray diffraction (XRD). The static magnetic properties were measured by Vibrating Sample magnetometer (VSM) and ex-situ ferromagnetic resonance (FMR).