Room temperature atomic layer deposition of TiO2 on gold nanoparticles
Room temperature atomic layer deposition of TiO2 on gold nanoparticles
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DOI：
10.1116/1.4971398
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发表时间：
2017
期刊：
影响因子：
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通讯作者：
Koudai Kikuchi;M. Miura;K. Kanomata;B. Ahmmad;S. Kubota;F. Hirose
中科院分区：
文献类型：
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作者：
Koudai Kikuchi;M. Miura;K. Kanomata;B. Ahmmad;S. Kubota;F. Hirose
作者开发了一种室温原子层沉积（ALD）系统，该系统可以利用四甲基钛和等离子体激发的湿化氩在金纳米颗粒上沉积TiO2。在监测的Si样品上，TiO2的每周期生长为0.25 nm/周期。在应用纳米颗粒涂层时，源材料，即金颗粒，以静电方式附着在ALD系统中的感受器上，以避免它们的气体传输。这些颗粒然后在ALD过程中由旋转刮板混合。该系统允许TiO2的保形沉积而不聚集纳米颗粒。通过计算ALD循环次数来控制外壳涂层TiO2的厚度。本文演示了在金纳米粒子上沉积纳米级厚度的TiO2涂层。
The authors developed a room temperature atomic layer deposition (ALD) system that can deposit TiO2 on gold nanoparticles by using tetrakis(dimethylamino)titanium and plasma-excited humidified argon. The growth per cycle of TiO2 was measured to be 0.25 nm/cycle on a monitored Si sample. For applying the nanoparticle coating, the source material, i.e., gold particles, is electrostatically attached to the susceptor in the ALD system to avoid their gas transport. These particles are then mixed by a rotating scraper during the ALD process. This system allows a conformal deposition of TiO2 without the aggregation of nanoparticles. The thickness of TiO2 for shell coating is controlled by counting the number of ALD cycles. The deposition of TiO2 coating with a nanometer scale thickness on the gold nanoparticle is demonstrated in this paper.