Magnetic properties of Fe-Co thin films deposited by ion beam sputtering.
Magnetic properties of Fe-Co thin films deposited by ion beam sputtering.
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离子束溅射沉积的 Fe-Co 薄膜的磁性。
DOI：
10.3379/jmsjmag.10.315
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发表时间：
1986
影响因子：
--
通讯作者：
M. Naoe
中科院分区：
文献类型：
--
作者：
Y. Hoshi;M. Naoe
使用离子束溅射装置沉积了铁钴合金薄膜（0-54 at.% Co-Fe），并详细研究了它们的磁性能。所有薄膜都具有20 kG以上的大饱和磁通密度。衬底温度Ts约为75℃时沉积的薄膜具有较大的垂直磁各向异性场Hk⊥（>110 Oe）和较高的矫顽力Hc（>50 Oe），而随着Ts的增加，Hk⊥和Hc均显着下降。 Ts高于250℃时沉积的薄膜垂直磁各向异性完全消失，Co含量为50-54at.%的薄膜具有最低的Hc，低至5 Oe。 Ts 从 75°C 降低到 250°C 也会导致薄膜的内应力从压应力变为拉应力，并伴随微晶的生长。真空退火对薄膜磁性能和内应力变化的影响与 Ts 的增加几乎相同。这些磁性能随Ts或退火温度的变化被认为主要是由应力引起的磁各向异性能的变化引起的，因为Fe-Co合金膜具有大的正磁致伸缩常数。
Iron-cobalt alloy thin films (0-54 at.% Co-Fe) were deposited using an ion beam sputtering apparatus and their magnetic properties were investigated in detail.All of the films have large saturation magnetic flux density above 20 kG. The films deposited at substrate temperature Ts of about 75°C have a large perpendicular magnettc anisotropy field Hk⊥ (>110 Oe) and high coercive force Hc (>50 Oe), while the increase of Ts shows a significant decrease in both Hk⊥ and Hc. The perpendicular magnetic anisotropy of the film deposited at Ts above 250°C disappears completely, and films with Co content of 50-54at.% have the lowest Hc, as low as 5 Oe. The decrease of Ts from 75°C to 250°C also causes a change in the internal stress of the films from compressive to tensile stress along with a growth of crystallites. Annealing the films in a vacuum has nearly the same effect on changes of their magnetic properties and internal stress as the increase of Ts. These changes in magnetic properties with Ts or annealing temperature are considered mainly caused by the change of stress induced magnetic anisotropy energy, since the Fe-Co alloy film has a large positive magnetostriction constant.