The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates.
The effect of oxygen-containing reagents on the crystal morphology and orientation in tungsten oxide thin films deposited via atmospheric pressure chemical vapour deposition (APCVD) on glass substrates.
复制标题
含氧试剂对通过常压化学气相沉积 (APCVD) 在玻璃基板上沉积的氧化钨薄膜的晶体形态和取向的影响。
作者：
G. Hyett;C. Blackman;I. Parkin
以WCl6和三种含氧前驱体为原料，采用常压化学气相沉积法制备了单斜WO3和WO（3-x）薄膜；水，乙醇和乙酸酐。根据所选择的氧源，观察到薄膜的颜色，晶体形态和首选取向的广泛变化。与此形成鲜明对比的是由WCl6和乙醇形成的薄膜，呈蓝色，具有针状晶体；由WCl6和水形成的薄膜呈黄色，具有六角形晶体。还进行了WCl6、乙醇和水同时形成薄膜的研究，其中乙醇与水的比例不同，从而可以控制薄膜的晶体形态和取向。
Thin films of monoclinic WO3 and WO(3-x) have been synthesized by atmospheric pressure chemical vapour deposition from WCl6 and three oxygen containing precursors; water, ethanol and ethanoic anhydride. A wide variation in the colour, crystal morphology and preferred orientation of the films was observed, depending on the chosen oxygen source. In particular contrast were the films formed from WCl6 and ethanol, which were blue and had needle-like crystallites, and those formed from WCl6 and water, which were yellow and had hexagonal shaped crystallites. Studies were also undertaken to form films from WCl6, ethanol and water simultaneously, in which the ratio of ethanol to water was varied, and this led to films in which the crystal morphology and orientation could be controlled.