Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel
Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel
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DOI：
10.35848/1347-4065/ab7438
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发表时间：
2020-03
影响因子：
1.5
通讯作者：
T. Horiuchi;Hayato Okiyama;R. Sato;Hiroshi Kobayashi
中科院分区：
文献类型：
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作者：
T. Horiuchi;Hayato Okiyama;R. Sato;Hiroshi Kobayashi
为了利用液晶显示(LCD)面板的无掩模光刻技术印刷厚抗蚀剂图形，开发了一种新的双层抗蚀剂工艺。在过去的研究中，简单且低成本的无掩模曝光系统是用LCD面板代替掩模来开发的。然而，商业LCD的制造不是为了保护人类的眼睛而照射短波长的光线。因此，只有薄的g线抗蚀剂适用于印刷图案。然而，为了制造流体器件、透镜阵列等，经常需要在10-100μm厚的抗蚀剂中进行图案化。为此，传统的g线抗蚀剂被涂覆在厚的UV抗蚀剂上，并且使用LCD无掩模光刻形成的g线抗蚀剂的图案被用作底层UV抗蚀剂的曝光掩模。结果，在70μm厚的UV抗蚀剂上成功地印制了宽度低至40μm、侧壁几乎垂直的各种测试图案。
To utilize maskless lithography using a liquid-crystal-display (LCD) panel for printing thick resist patterns, a novel two-layer resist process was developed. In the past research, simple and low-cost maskless exposure system was developed using an LCD panel in place of a reticle. However, commercial LCDs were fabricated not to irradiate short-wavelength light rays for protecting human eyes. Therefore, only thin g-line resists have been applicable for printing patterns. Nevertheless, patterning in 10–100 μm thick resist is frequently required for fabricating fluidic devices, lens arrays, and others. For this reason, a conventional g-line resist was coated on a thick UV resist, and patterns of g-line resist formed using the LCD maskless lithography was used as exposure masks of the bottom layer UV resist. As a result, various test patterns with widths of down to 40 μm and almost vertical side walls were successfully printed in the 70 μm thick UV resist.