Additive nanoscale embedding of functional nanoparticles on silicon surface
Additive nanoscale embedding of functional nanoparticles on silicon surface
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DOI：
10.1039/c0nr00315h
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发表时间：
2010-01-01
期刊：
影响因子：
6.7
通讯作者：
Pasquali, Luca
中科院分区：
文献类型：
--
作者：
Cavallini, Massimiliano;Simeone, Felice C.;Pasquali, Luca
我们提出了一种新的添加剂工艺，它允许纳米颗粒（NPs）在硅表面内的空间控制集成。NPs放置在导电压印和硅表面之间；通过施加偏置电压，一层二氧化硅就会在戳戳突起的下方生长，从而嵌入颗粒。我们报道了成功地将CoFe2O4纳米颗粒嵌入线、网格和逻辑结构中。
We present a novel additive process, which allows the spatially controlled integration of nanoparticles (NPs) inside silicon surfaces. The NPs are placed between a conductive stamp and a silicon surface; by applying a bias voltage a SiO2 layer grows underneath the stamp protrusions, thus embedding the particles. We report the successful nanoembedding of CoFe2O4 nanoparticles patterned in lines, grids and logic structures.