Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene)
Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene)
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聚(苯乙烯-嵌段-三甲基硅异戊二烯)的合成及薄膜取向
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发表时间：
2013
期刊：
影响因子：
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通讯作者：
C. Willson
中科院分区：
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作者：
Christopher M. Bates;M. Pantoja;Jeffrey R. Strahan;Leon M. Dean;B. Mueller;Christopher J. Ellison;P. Nealey;C. Willson
报道了一种含硅嵌段共聚物聚（苯乙烯-嵌段-三甲基硅基异戊二烯）（P（S-b-TMSI））的成功合成、表征和定向自组装，该共聚物具有比聚（苯乙烯-嵌段-甲基丙烯酸甲酯）高得多的氧蚀刻对比度。Sakurai，Grignard型偶联反应以良好的产率提供了关键单体。采用活性阴离子聚合法制备了具有很低多分散性的嵌段共聚物。通过定向自组装成功地实现了P（S-b-TMSI）的有序化和定向化。© 2012 Wiley Periodicals，Inc. J Polym Sci Part A：Polym Chem，2013
The successful synthesis, characterization, and directed self-assembly of a silicon-containing block copolymer, poly(styrene-block-trimethylsilylisoprene) (P(S-b-TMSI)), which has much higher oxygen etch contrast than the de facto standard, poly(styrene-block-methyl methacrylate) is reported. A Sakurai, Grignard-type coupling reaction provided the key monomer in good yield. Living anionic polymerization was employed to prepare the block copolymer, which has very low polydispersity. P(S-b-TMSI) was successfully ordered and oriented by directed self-assembly. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013