Stable Trichlorosilane–Pyridine Adducts
Stable Trichlorosilane–Pyridine Adducts
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稳定的三氯硅烷-吡啶加合物
DOI：
10.1002/ejic.200800844
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发表时间：
2008
影响因子：
2.3
通讯作者：
E. Kroke
中科院分区：
文献类型：
--
作者：
Gerrit W Fester;J. Wagler;E. Brendler;E. Kroke
报道了R = H、4-CH3、4-C6H5、3- br、4-CHCH2、4-C2H5、4-C(CH3)3和4-N(CH3)2的八面体三氯硅烷加合物HSiCl3(Rpy)2的制备，并首次进行了全面的光谱和结构表征。该产物在固体状态下具有惊人的稳定性，并且易于获得高收率。单晶x射线衍射分析显示，HSiCl3(3-Brpy)2的Si-Cl键相对较短（218-223 pm），而Si-N键（约198 pm）仅比相应的H2SiCl2(Rpy)2加合物稍长。歧化反应只在极性溶剂中高温下观察到。（©Wiley-VCH Verlag GmbH & Co. KGaA，德国Weinheim 69451, 2008）
The prepapration, and first comprehensive spectroscopic and structural characterization of octahedral trichlorosilane adducts HSiCl3(Rpy)2 with R = H, 4-CH3, 4-C6H5, 3-Br, 4-CHCH2, 4-C2H5, 4-C(CH3)3 and 4-N(CH3)2 is reported. The products are surprisingly stable in the solid state and easily obtained in high yield. Single-crystal X-ray diffraction analysis of HSiCl3(3-Brpy)2 revealed relatively short Si–Cl bonds (218–223 pm) while the Si–N bonds (ca. 198 pm) are only slightly longer than in the corresponding H2SiCl2(Rpy)2adducts. Dismutation reactions were observed only in polar solvents at elevated temperatures.(© Wiley-VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2008)