Effect of oxygen flow rate on microstructure properties of SiO2 thin films prepared by ion beam sputtering
Effect of oxygen flow rate on microstructure properties of SiO2 thin films prepared by ion beam sputtering
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DOI：
10.1016/j.jnoncrysol.2017.12.046
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发表时间：
2018-02
影响因子：
3.5
通讯作者：
Lishuan Wang;Jiang Yugang;Jiang Chenghui;Hua-song Liu;Yi-qin Ji;Feng Zhang;R. Fan;Deying Chen
中科院分区：
文献类型：
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作者：
Lishuan Wang;Jiang Yugang;Jiang Chenghui;Hua-song Liu;Yi-qin Ji;Feng Zhang;R. Fan;Deying Chen
研究了离子束溅射法制备的SiO2薄膜的光学常数和微结构特性。在硅和二氧化硅的衬底上以10sccm的步长以不同的氧气流量从0到40sccm范围内制备样品。利用光谱反演技术得到了样品的折射率。结果表明，随着氧气流量的增大，薄膜的折射率值呈现先减小后增大的变化趋势，在0.633 μm和10.6 μm处的折射率值均在30sccm左右出现转折点。通过X射线衍射测试证实SiO2薄膜均为非晶结构。利用XPS测定了SiO2薄膜中羟基的比例，为分析薄膜缺陷提供了依据。通过红外光谱研究了硅氧硅角和TO模和LO模的振动频率。
Optical constants and micro-structure characteristics of SiO2films deposited by ion beam sputtering were studied. The samples were prepared on substrates of silicon and silica with different oxygen flow rates ranged from 0 sccm to 40 sccm with a step of 10 sccm. Refractive index of the samples were obtained by spectra inversion technique. It's suggested that the value of refractive index presents first decrease and then increase as the oxygen flow rate larger, and the turning point is about 30 sccm both at 0.633 μm and 10.6 μm. And the SiO2thin films were confirmed all amorphous structure by the XRD measurement. The proportion of hydroxyl in SiO2thin film were determined by XPS, which is beneficial to analyze the film defects. Also the Si-O-Si angle and vibration frequency in TO mode and LO mode were researched by FTIR spectra.