Characterization of Ni thin films following thermal oxidation in air
Characterization of Ni thin films following thermal oxidation in air
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DOI：
10.1116/1.4895846
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发表时间：
2014-09
影响因子：
1.4
通讯作者：
L. De Los Santos Valladares;A. Ionescu;S. Holmes;C. Barnes;A. B. Bustamante Dominguez;Oswaldo Avalos Quispe;J. González;S. Milana;M. Barbone;A. Ferrari;H. Ramos;Y. Majima
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文献类型：
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作者：
L. De Los Santos Valladares;A. Ionescu;S. Holmes;C. Barnes;A. B. Bustamante Dominguez;Oswaldo Avalos Quispe;J. González;S. Milana;M. Barbone;A. Ferrari;H. Ramos;Y. Majima
作者研究了通过常规热蒸发制备的镍薄膜（50 nm）的热氧化，这些镍薄膜是在空气中在300、325、350、400和700 °C下退火产生的。的表征是通过X射线衍射，拉曼光谱，超导量子干涉装置磁力仪，和扫描电子显微镜。这些技术表明，随着退火温度的增加，氧化增加。在400 °C下退火后，证实了Ni和NiO共存的颗粒膜的形成。磁性测量表明铁磁性和反铁磁性共存，对应于Ni和NiO的贡献。磁滞回线揭示了在235、350和400 °C退火的样品中由于Ni/NiO界面处的交换相互作用之间的竞争而导致的交换偏置。
The authors study the thermal oxidation of nickel thin films (50 nm) fabricated by conventional thermal evaporation, resulting from annealing in air at 300, 325, 350, 400, and 700 °C. The characterization is performed by x-ray diffraction, Raman spectroscopy, superconducting quantum interference device magnetometry, and scanning electron microscopy. These techniques show that the oxidation increases with annealing temperature. The formation of granular films of coexisting Ni and NiO is confirmed after annealing at 400 °C. The magnetic measurements indicate coexisting ferromagnetism and antiferromagnetism, corresponding to Ni and NiO contributions. The magnetic hysteresis loops reveal exchange bias in the samples annealed at 235, 350, and 400 °C due to the competition between the exchange interactions at the Ni/NiO interfaces.